The group is concerned with r.f. magnetron sputtering of thin films for more than ten years. We have been preparing thin films (e.g. Al, Si ,Mo, Ti, Ni, Ag, C, ITO, Nb, W, TiN, Si3N4, SiO2 and their combination) intended for the use in projects of our Institute. In our laboratory we started production of multilayer systems consisting of a large number of double layers of nanometer thickness for use in the x-ray optics.