Industrial Holography using E-Beam Lithography

• Large-area micro structures as optical elements for shaping of laser beam;
• Sub-micron holographic structure in the application area of industrial holography;
• DOVID — Diffractive Optically Variable Image Device

Results

As an example, some DOVID's were designed and implemented for public presentation of the Institute of Scientific Instruments (ISI) and The Czech Academy of Sciences (CAS).

DOVID "isi9". Exposure using the pattern generator EBPG5000+ES. Produced to mark the 60th anniversary of the ISI (2017).

E-Beam Lithography Group (EBL)

Research Areas:

• EBL for Nanotechnologies
• Microlithography Techniques
• Nanolitography
• Industrial Holography using E-Beam Lithography

Offered Technologies:

• Optical Diffractive Structures
• E-Beam Lithography Technology

DOVID "cas1". Exposure using the pattern generator EBPG5000+ES. Produced to mark the 125th anniversary of the CAS (2015).