TOPICS
Thematic area 1: Optical elements for X&XUV region: preparation of substrates and their diagnostics; preparation of reflecting (multilayer) structures, their design, diagnostics, aging; preparation of other elements (pinholes, Fresnel lenses, diffraction gratings for Talbot imaging as well as for spectroscopy, etc.).
Thematic area 2: Application of optical elements to imaging and focusing: imaging of various objects by incoherent or coherent radiation (magnifying and de-magnifying projections), nanostructuring of solid surfaces, focusing of radiation for radiation-matter interaction studies and related metrology, etc.
Thematic area 3: Application of optical elements to spectroscopy and interferometry: spectroscopy of X&XUV radiation, interferometry with X&XUV radiation, etc.